CCD

Charged Coupled Device

Charge coupled devices are widely used as sensors in cameras, video cameras, and scanners. In CCDs charge is generated by received photons. The generated charge is accumulated and transferred to insulated electrodes. At the insulated electrodes the charges are read out and converted to a digital value.

CCT

Correlated Color Temperature

A specification for white light sources used to describe the dominant color tone along the dimension from warm (yellows and reds) to cool (blue).
Lamps with a CCT rating below 3200 Kelvin are usually considered warm sources, whereas those with a CCT above 4000 Kelvin usually considered cool in appearance. Temperatures in between are considered neutral in appearance. The temperature at which the heated black body radiator matches the color of the light source is that source’s color temperature.

CDT

Cambridge Display Technologies

A UK-based company (owned by Sumitomo Chemical) that develops polymer-based OLED (P-OLED) technologies.

CE= (cd /A)

Current Efficiency

Current Efficiency is a measure for the efficiency of an OLED. Current Efficiency is given as the ratio of the brightness and the electrical current at which the brightness is achieved.

CFL

compact fluorescent lamp

Charge Transport

Charge transport is the process of charges passing from one molecule to an other. In an OLED charges (here: electrons, holes) are transported from the electrodes to the emission layer under an electric field.

CIE

International Commision on Illumination (Commision Internationale de le Èclairage)

CIE is the international authority on the characterization of light, illumination, colour, and colour spaces. 

CRI

Color Rendering Index

Light sources vary in their ability to accurately reflect the true colors of objects. The color rendering index CRI scale is used to compare the effect of a light source on the color appearance of its surroundings. The higher the color rendering index, the less color shift or distortion occurs.

CVD

Chemical Vapor Deposition

Chemical Vapor Deposition is the most common thin film deposition method in advanced semiconductor manufacturing. One or more volatile chemicals are deposited onto a substrate. The chemicals react with each other or the substrate to form the desired product. Residuals and by-products are removed with a gas flow from the deposition chamber.